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Investigation of the influence of a dislocation loop layer on interstitial kinetics during surface oxidation of silicon

โœ Scribed by D Tsoukalas; D Skarlatos; J Stoemenos


Book ID
114164414
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
106 KB
Volume
178
Category
Article
ISSN
0168-583X

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