Investigation of SiO2 films obtained by oxidation of silicon hydride in gas-discharge plasma: R P Kalnynya et al, Izv Akad Nauk Latv SSR Ser Fiz Tekh Nauk, No 3, 1971, 50–56 (in Russian)

• Publisher: Elsevier Science
• Year: 1972
• Tongue: English
• Weight: 178 KB
• Volume: 22
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(72)90559-3