913. Investigation of surface layer of silicon after etching in high-frequency gas-discharge plasma: R P Berzinya et al, Izv AN Latv SSR Ser Fiz Tekh Nauk, o, 3, 1973, 25–28, (in Russian)

• Publisher: Elsevier Science
• Year: 1974
• Tongue: English
• Weight: 159 KB
• Volume: 24
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(74)90581-8