Investigation of SiO2 deposition processes with mass spectrometry and optical emission spectroscopy in plasma enhanced chemical vapor deposition using tetraethoxysilane

✍ Scribed by Naohiro Maeda Horii; Kunio Okimura; Akira Shibata

• Book ID: 114086698
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 358 KB
• Volume: 343-344
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/s0040-6090(98)01650-2