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Investigation of frequency dependent and independent dielectric maxima in relaxor ferroelectric thin films

✍ Scribed by Correa, Margarita; Kumar, Ashok; Katiyar, R. S.

Book ID
121191499
Publisher
American Institute of Physics
Year
2007
Tongue
English
Weight
476 KB
Volume
91
Category
Article
ISSN
0003-6951

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## Abstract Pb(Fe~2/3~W~1/3~)O~3~ (PFW) thin films were deposited on platinized silicon substrate by a chemical solution deposition technique. Room‐temperature X‐ray diffraction (XRD) revealed a pure cubic crystal structure of the investigated material. The microstructure indicated good homogeneity