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Investigation of back gate interface states by drain current hysteresis in PD-SOI n-MOSFETs

✍ Scribed by K. Hayama; K. Takakura; S. Okada; T. Kudou; H. Ohyama; J.M. Rafí; J.A. Martino; A. Mercha; E. Simoen; C. Claeys


Book ID
108239043
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
158 KB
Volume
376-377
Category
Article
ISSN
0921-4526

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Temperature dependence of drain current
✍ K. Hayama; K. Takakura; H. Ohyama; J.M. Rafí; A. Mercha; E. Simoen; C. Claeys 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 175 KB

The hysteresis characteristics of the drain current (I D ) in FD-SOI n-MOSFETs are examined at different back gate voltage and temperature. The relationship between the hysteresis and the temperature is discussed in comparison with the result for PD-SOI n-MOS-FETs, taking into account the back gate