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Investigation of Al2O3 layers obtained by DC planar-magnetron sputtering

✍ Scribed by Kirov, K. I. ;Atanasova, E. D. ;Ivanov, N. A.

Publisher
John Wiley and Sons
Year
1978
Tongue
English
Weight
382 KB
Volume
50
Category
Article
ISSN
0031-8965

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Al 2 O 3 films were deposited by reactive ionized magnetron sputtering and their hardness was measured by nanoindentation. The magnetron was powered with a pulsed DC power supply, and the substrate was negatively biased with a pulsed DC voltage supply. An RF powered coil was located above the substr