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Investigation and modeling of the electrical properties of metalâoxideâmetal structures formed from chemical vapor deposited Ta[sub 2]O[sub 5] films

✍ Scribed by Blonkowski, S.; Regache, M.; Halimaoui, A.

No coin nor oath required. For personal study only.

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Investigation and modeling of the electrical properties of metalâoxideâmetal structures formed from chemical vapor deposited Ta[sub 2]O[sub 5] films