๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Introduction to focused section: Developments in high-speed integrated semiconductor devices

โœ Scribed by Mavor, John


Book ID
114453930
Publisher
The Institution of Electrical Engineers
Year
1980
Weight
69 KB
Volume
127
Category
Article
ISSN
0143-7100

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Fabrication of high-aspect-ratio submicr
โœ Shizhuo Yin ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 150 KB ๐Ÿ‘ 2 views

The fabrication of high-aspect-ratio submicron-to-nanometer range microstructures in LiNbO using a state-of-the-art Schlum-3 ( ) berger AMS 3000 focused ion-beam FIB system is presented. The submicron structures with about 350 nm width and 1600 nm depth are fabricated by employing XeF gas-assisted g