Internal stresses in amorphous silicon films depositied by cylindrical magnetron sputtering using Ne, Ar, Kr, Xe, and Ar+H2

✍ Scribed by Thornton, J. A.

• Book ID: 127268885
• Publisher: AVS (American Vacuum Society)
• Year: 1981
• Weight: 881 KB
• Volume: 18
• Category: Article
• ISSN: 0022-5355
• DOI: 10.1116/1.570724