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Internal stresses in amorphous silicon films deposited by cylindrical magnetron sputtering using Ne, Ar, Kr, Xe and Ar + H2: J A Thornton and D W Hoffman, J Vac Sci Technol, 18 (2), 1981, 203–207


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
169 KB
Volume
32
Category
Article
ISSN
0042-207X

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