Content:
Preface, Pages v-vii, S.P. Murarka, M. Eizenberg, A.K. Sinha
Acknowledgements, Page ix
List of Contributors, Pages xi-xii
Chapter 1 - Introduction: Interlayer dielectrics in microelectronic devices, Pages 1-6, M. Eizenberg
Chapter 2 - Dielectric properties, Pages 7-36, S.P. Murarka
Chapter 3 - Characterization of low dielectric constant materials, Pages 37-76, P.S. Ho, J. Liu, M. Morgen, M. Kiene, J.-H. Zhao, C. Hu
Chapter 4 - Compatibilities of dielectric films, Pages 77-119, C.K. Goldberg, V.S. Wang
Chapter 5 - Silicon-based dielectrics, Pages 121-156, C. Leung, E. Ong
Chapter 6 - Low-ฮบ polymers, Pages 157-199, S.P. Murarka
Chapter 7 - Chemical vapor deposition of C-F low-k materials, Pages 201-225, M. Uhlig, T. Gessner
Chapter 8 - Spin-on Si-based low-k materials, Pages 227-259, S.E. Schulz, T. Gessner
Chapter 9 - Nanoporous dielectric films: Fundamental property relations and microelectronics applications, Pages 261-325, J.L. Plawsky, W.N. Gill, A. Jain, S. Rogojevic
Chapter 10 - High-k dielectrics grown by atomic layer deposition: Capacitor and gate applications, Pages 327-348, M.D. Groner, S.M. George
Chapter 11 - Dielectric materials in optical waveguide aplications, Pages 349-389, P.D. Persans, F. Huang, N. Agarwal, S. Ponoth, J.L. Plawsky
Chapter 12 - Reliability, Pages 391-407, S.P. Murarka
Chapter 13 - Future trends in silicon technologies, Pages 409-427, E. Ong, A. Sinha
Index, Pages 429-444