Interferometric method for checking the mask alignment precision in the lithographic process

✍ Scribed by Makosch, G. ;Schoenes, F. J.

• Book ID: 115332058
• Publisher: The Optical Society
• Year: 1984
• Tongue: English
• Weight: 570 KB
• Volume: 23
• Category: Article
• ISSN: 1559-128X
• DOI: 10.1364/AO.23.000628