Interfacial reactions of Ni/Si0.76Ge0.24 and Ni/Si1−x−yGexCy by vacuum annealing and pulsed KrF laser annealing

✍ Scribed by Jian-Shing Luo; Wen-Tai Lin; C.Y. Chang; P.S. Shih

• Book ID: 114163989
• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 488 KB
• Volume: 169
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/s0168-583x(00)00028-8