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Interfacial chemistry and structures of ultrathin Si oxynitride films

✍ Scribed by M. Oshima; K. Kimura; K. Ono; K. Horiba; K. Nakamura; H. Kumigashira; J.-H. Oh; M. Niwa; K. Usuda; N. Hirashita

No coin nor oath required. For personal study only.

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