Interface engineering for the passivation of c-Si with O3-based atomic layer deposited AlOx for solar cell application

✍ Scribed by Lee, Hyunju; Tachibana, Tomihisa; Ikeno, Norihiro; Hashiguchi, Hiroki; Arafune, Koji; Yoshida, Haruhiko; Satoh, Shin-ichi; Chikyow, Toyohiro; Ogura, Atsushi

• Book ID: 121324288
• Publisher: American Institute of Physics
• Year: 2012
• Tongue: English
• Weight: 893 KB
• Volume: 100
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.3701280