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Interaction of copper organometallic precursors with barrier layers of Ti, Ta and W and their nitrides: a first-principles molecular dynamics study

✍ Scribed by Eduardo Machado; Marcin Kaczmarski; Benoît Braida; Pablo Ordejón; Diwakar Garg; John Norman; Hansong Cheng


Publisher
Springer-Verlag
Year
2007
Tongue
English
Weight
434 KB
Volume
13
Category
Article
ISSN
1610-2940

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