Integration of a stack of two fluorine doped silicon oxide film with ULSI interconnect metallization

✍ Scribed by Y.L. Cheng; Y.L. Wang; C.P. Liu; Y.L. Wu; K.Y. Lo; C.W. Liu; J.K. Lan; Chyung Ay; M.S. Feng

• Book ID: 113780579
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 671 KB
• Volume: 83
• Category: Article
• ISSN: 0254-0584
• DOI: 10.1016/j.matchemphys.2003.08.023