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Inorganic Nanodots from Thin Films of Block Copolymers

โœ Scribed by Kim, Dong Ha; Kim, Seung Hyun; Lavery, Kris; Russell, Thomas P.

Book ID
126973851
Publisher
American Chemical Society
Year
2004
Tongue
English
Weight
498 KB
Volume
4
Category
Article
ISSN
1530-6984

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## Abstract A polystyreneโ€__block__โ€poly(ethylene oxide) block copolymer bearing a photocleavable junction between the blocks is used to form nanoporous thin films with carboxylic acid functions homogeneously distributed on the pore walls. The presence of the carboxylic acid groups is evidenced by

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The dewetting of thin films of low molecular weight diblock and triblock copolymers of poly(oxyethylene)/poly(oxybutylene) on silicon has been studied using video microscopy and X-ray reflectivity. Dewetted films were observed to comprise polygonal domains of polymer droplets, with a domain size of