## Abstract In order to improve GaN‐based light‐emitting diode (LED) performance, a sapphire‐etched vertical‐electrode nitride semiconductor (SEVENS) LED is fabricated by a chemical wet etching technique. The light‐output power, heat dissipation, and reverse electrostatic discharge (ESD) characteri
Injection current-dependent quantum efficiency of InGaN-based light-emitting diodes on sapphire and GaN substrates
✍ Scribed by Yang, Y. ;Cao, X. A. ;Yan, C. H.
- Publisher
- John Wiley and Sons
- Year
- 2009
- Tongue
- English
- Weight
- 315 KB
- Volume
- 206
- Category
- Article
- ISSN
- 0031-8965
No coin nor oath required. For personal study only.
✦ Synopsis
Abstract
We studied the nonthermal mechanism of quantum efficiency (QE) roll‐off in InGaN‐based multiple‐quantum‐well LEDs on sapphire and bulk GaN substrates with In content ranging from 1% to 28%. Both the efficiency evolution and peak energy shift appear to be strongly dependent on the In content, but nearly independent of the dislocation density in the active region. The QE of the green LED peaks at a current density as low as 1.4 A/cm^2^, and decreases dramatically as current is increased, whereas the UV LED has a nearly constant QE at currents up to 1 kA/cm^2^. In contrast to minimal current‐induced peak shift and spectral broadening in the near‐UV and UV LED, the green LED has a monotonic peak blueshift of a total amount of ∼110 meV and a spectral broadening by a factor of 2. These results lead to a conclusion that carrier delocalization followed by nonradiative recombination at misfit defects is the major nonthermal mechanism of the efficiency roll‐off in InGaN‐based visible LEDs. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
📜 SIMILAR VOLUMES
Spectra and quantum efficiency h e of green LEDs based on heterostructures InGaN/AlGaN/GaN with multiple quantum wells were studied at currents J = 10 ± ±6 to 10 ± ±1 A. Minor differences in h e (of AE10% at J % 10 mA) are caused by sufficiently different distributions of effective charges in the sp
## Abstract InGaN light‐emitting diodes (LEDs) on GaN substrates with low threading dislocation densities (TDDs) were fabricated, and the characteristics of the LEDs were compared with those on sapphire substrates. LEDs with 3 nm‐thick‐quantum‐wells (QWs) grown on GaN as well as on sapphire substra
## Abstract The non‐polar m‐plane InGaN/GaN light‐emitting diodes (LEDs) grown by metal‐organic chemical vapor deposition (MOCVD) on LiAlO~2~(100) substrates were investigated. The structure of LEDs is composed by GaN p–n junction and five InGaN/GaN multiple quantum wells (MQWs). They emit blue or