The vapor phase deposition of polymeric antimicrobial coatings is reported. Initiated chemical vapor deposition (iCVD), a solventless low-temperature process, is used to form thin films of polymers on fragile substrates. For this work, finished nylon fabric is coated by iCVD with no affect on the co
Initiated Chemical Vapor Deposition of Poly(furfuryl methacrylate)
✍ Scribed by Guohua Chen; Malancha Gupta; Kelvin Chan; Karen K. Gleason
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 151 KB
- Volume
- 28
- Category
- Article
- ISSN
- 1022-1336
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✦ Synopsis
Abstract
Furan ring‐functionalized solid surfaces are achieved by the initiated chemical vapor deposition (iCVD) method, a solvent‐free process to form films under mild conditions. The polymerization of furfuryl methacrylate monomer is initiated by a resistively heated filament wire. The functionality of the furan group in the iCVD film enabled Diels–Alder chemistry with 4‐phenyl‐1,2,3‐triazolin‐3,5‐dione (N‐PTD).
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