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Initial growth conditions for MBE-grown GaN using high-temperature AlN buffer layer

✍ Scribed by K. Kaneko; N. Iizuka; N. Suzuki


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
141 KB
Volume
2
Category
Article
ISSN
1862-6351

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## Abstract The structural properties of 2 ¡m thick N‐face InN film, grown on Si (111) by plasma source molecular beam epitaxy after the initial deposition of 20 nm AlN and 40 nm GaN, were examined by transmission electron microscopy. The lattice mismatched GaN/AlN and InN/GaN interfaces limited th