The vertical-cavity surface-emitting laser (VCSEL) operating with low threshold current is a promising way to realize future parallel optical interconnects. In this study, we propose a novel structure of p-type delta-doped In-GaAs/GaAs quantum wells for low-threshold, high-speed VCSELs. Edge-emittin
InGaAs/GaAs vertical-cavity surface-emitting lasers with AlAs selective oxide layers
โ Scribed by Nobuaki Hatori; Toshikazu Mukaihara; Noriyuki Ohnoki; Akimasa Mizutani; Makoto Abe; Akihiro Matsutani; Fumio Koyama; Kenichi Iga
- Publisher
- John Wiley and Sons
- Year
- 1998
- Tongue
- English
- Weight
- 220 KB
- Volume
- 81
- Category
- Article
- ISSN
- 8756-663X
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โฆ Synopsis
A laser operating at low threshold current is indispensable for the construction of superparallel optical interconnections. Initially we examine the current threshold characteristics of surface emitting InGaAs/GaAs lasers, and demonstrate the possibility for working with a threshold current below 100 mA. Next, vertical-cavity AlAs oxide layers are used, since they are helpful in achieving a low threshold surface-emitting laser, and the optimum conditions for forming the AlAs oxide layer are determined.
New InGaAs/GaAs surface-emitting lasers with AlAs oxide layer are fabricated and a low threshold current operation of 70 mA is achieved by current injection through micro-domains and reduction of the dark recombination current. Further low threshold current operation should be achievable by fine control and micronization of oxide lay-
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