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Infrared study of chemistry of Si surfaces in etching solution

โœ Scribed by Michio Niwano; Taka-aki Miura; Ryo Tajima; Nobuo Miyamoto


Book ID
103619354
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
419 KB
Volume
100-101
Category
Article
ISSN
0169-4332

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๐Ÿ“œ SIMILAR VOLUMES


Etching processing of Si(111) and Si(100
โœ Masanori Nakamura; Moon-Bong Song; Masatoki Ito ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 512 KB

situ real-time measurements of etching processes by infrared total reflection spectroscopy were carried out for the first time on Si(ll1) and Si(100) surfaces in ammonium fluoride solution. The absorption bands became broad by the interaction between terminal hydrides with water molecules. On Si(lll