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The mechanism of Si etching in fluoride solutions

✍ Scribed by Kolasinski, Kurt W.

Book ID
111895195
Publisher
Royal Society of Chemistry
Year
2003
Tongue
English
Weight
194 KB
Volume
5
Category
Article
ISSN
1463-9076

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Etching processing of Si(111) and Si(100
Etching processing of Si(111) and Si(100) surfaces in an ammonium fluoride solution investigated by in situ ATR-IR
✍ Masanori Nakamura; Moon-Bong Song; Masatoki Ito πŸ“‚ Article πŸ“… 1996 πŸ› Elsevier Science 🌐 English βš– 512 KB

situ real-time measurements of etching processes by infrared total reflection spectroscopy were carried out for the first time on Si(ll1) and Si(100) surfaces in ammonium fluoride solution. The absorption bands became broad by the interaction between terminal hydrides with water molecules. On Si(lll