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Infrared ellipsometry study of the vibrational properties of growing microcrystalline silicon thin films

✍ Scribed by N. Blayo; B. Drevillon

Book ID
117147109
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
293 KB
Volume
137-138
Category
Article
ISSN
0022-3093

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In this work we present a study of the optical, electrical, electronic and structural properties of Boron doped hydrogenated microcrystalline silicon thin films (mc-Si:H). The films were deposited in an RF plasma reactor using as reactive gas a mixture of silane and diborane, both highly diluted in