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Influence on the electrical characteristics of the -NH radicals incorporated into PECVD silicon nitride films

✍ Scribed by O Sanchez; C Gomez-Aleixandre; M Fernandez; JM Albella


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
291 KB
Volume
39
Category
Article
ISSN
0042-207X

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