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Influence on the electrical characteristics of the—NH radicals incorporated into PECVD silicon nitride films : O. Sanchez, C. Gomez-Aleixandre, M. Fernandez and J. M. Albella. Vacuum39(7/8), 727 (1989)


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
129 KB
Volume
30
Category
Article
ISSN
0026-2714

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