Influence of implantation conditions of
โ
Shcherbachev, Kirill ;Bailey, Melanie J.
๐
Article
๐
2011
๐
John Wiley and Sons
๐
English
โ 712 KB
## Abstract An investigation into the influence of implantation conditions (dose, energy, and target temperature) of He^+^ ions on the damage structure of GaAs (100) substrates was performed by HRXRD, scanning electron microscopy, and Nomarski microscopy. Blistering is shown to become apparent as c