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Influence ofin situphotoexcitation on structure of damaged layer in GaAs (001) substrates implanted with Ar3+ions

โœ Scribed by K. D. Shcherbatchev; V. T. Bublik; Yu. F. Trush; A. S. Markevich; V. N. Mordkovich


Book ID
110134034
Publisher
SP MAIK Nauka/Interperiodica
Year
2003
Tongue
English
Weight
71 KB
Volume
48
Category
Article
ISSN
1063-7745

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Influence of implantation conditions of
โœ Shcherbachev, Kirill ;Bailey, Melanie J. ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 712 KB

## Abstract An investigation into the influence of implantation conditions (dose, energy, and target temperature) of He^+^ ions on the damage structure of GaAs (100) substrates was performed by HRXRD, scanning electron microscopy, and Nomarski microscopy. Blistering is shown to become apparent as c