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Influence of tungsten sputtering target density on physical vapor deposition thin film properties

โœ Scribed by Chi-Fung Lo; Peter McDonald; Darryl Draper; Paul Gilman

Book ID
107453422
Publisher
Springer US
Year
2005
Tongue
English
Weight
438 KB
Volume
34
Category
Article
ISSN
0361-5235

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A range of calcium phosphate (Ca-P) coatings have been sputter deposited at low deposition power from Ca-P targets with different phase compositions. The resultant surfaces were analysed both before and after post-deposition annealing (PDA) using X-ray Diffraction (XRD), Fourier Transform Infrared S