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Influence of thermal treatment of low dielectric constant SiOC(H) films using MTES/O2 deposited by PECVD

✍ Scribed by R. Navamathavan; Seung Hyun Kim; Yong Jun Jang; An Soo Jung; Chi Kyu Choi

Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 821 KB
Volume: 253
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2007.04.075

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