๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Influence of the surrounding ambient on the reliability of the electrical characterization of thin oxide layers using an atomic force microscope

โœ Scribed by W. Hourani; B. Gautier; L. Militaru; D. Albertini; A. Descamps-Mandine; R. Arinero


Book ID
113800552
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
717 KB
Volume
51
Category
Article
ISSN
0026-2714

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Study of the influence of native oxide l
โœ H. Bluhm; U. D. Schwarz; F. Herrmann; P. Paufler ๐Ÿ“‚ Article ๐Ÿ“… 1994 ๐Ÿ› Springer ๐ŸŒ English โš– 757 KB

We have investigated the influence of the native oxide layer on semiconductor surfaces on the imaging properties of the atomic force microscope operated under ambient conditions by using epitaxial Inl\_xGaxAs layers grown by Metal-Organic Chemical Vapour Deposition (MOCVD) on (001) oriented InP subs