Characteristics of the electron-emission
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A.F. Zatsepin; S. Kaschieva; S.N. Dmitriev; E.A. Buntov
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Article
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2008
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Elsevier Science
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English
β 216 KB
Defects induced by high-energy electrons in Si-SiO 2 structure have been studied by the optically stimulated electron emission (OSEE) method. Si-SiO 2 structures with oxide thickness of 100 nm are irradiated with 23 MeV electrons for different durations. It is shown that most of the defects created