Influence of the surface electron processes on the kinetics of silicon etching by fluorine atoms : Yu E. Babanov, A. V. Prokaznikov and V. B. Svetovoy. Vacuum41(4–6), 902 (1990)

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 124 KB
• Volume: 31
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(91)90163-2