7342. Influence of the surface electron processes on the kinetics of silicon etching by flourine atoms: Yu E Babanov et al, Vacuum, 41, 1990, 902–905

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 142 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)91149-i