๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Influence of the sputtering pressure on lead silicate glassy film stoichiometry

โœ Scribed by V. Rigato; G. Maggioni; G. Della Mea

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
401 KB
Volume
74-75
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

The influence of target stoichiometry on
The influence of target stoichiometry on the surface properties of sputter deposited calcium phosphate thin films
โœ C. O'Kane; H. Duffy; B.J. Meenan; A.R. Boyd ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 859 KB

A range of calcium phosphate (Ca-P) coatings have been sputter deposited at low deposition power from Ca-P targets with different phase compositions. The resultant surfaces were analysed both before and after post-deposition annealing (PDA) using X-ray Diffraction (XRD), Fourier Transform Infrared S