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Influence of the nitrogen flow rate on the order and structure of PECVD boron nitride thin films

✍ Scribed by M. Anutgan; T. Aliyeva Anutgan; E. Ozkol; I. Atilgan; B. Katircioglu


Book ID
116671825
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
689 KB
Volume
355
Category
Article
ISSN
0022-3093

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Effect of nitrogen flow ratio on the str
✍ Shinho Cho πŸ“‚ Article πŸ“… 2011 πŸ› Elsevier Science 🌐 English βš– 674 KB

Aluminum nitride (AlN) films have been deposited on glass substrates at various nitrogen flow ratios by rf reactive magnetron sputtering. The AlN film deposited at 10% of nitrogen flow ratio shows a strongly c-axis preferred orientation with a crystalline size of 100 nm, thickness of 1100 nm, and ba