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Influence of surface fluorination on the oxidation of amorphous silicon by atomic oxygen at 300 K

โœ Scribed by W.C.M. Claassen; R.W.A.H. Schmitz; J. Dieleman

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
349 KB
Volume
43
Category
Article
ISSN
0169-4332

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๐Ÿ“œ SIMILAR VOLUMES

145. The formation of surface oxide by c
145. The formation of surface oxide by carbons during oxidation by atomic oxygen at different temperatures
โœ H Marsh; T.E O'Hair ๐Ÿ“‚ Article ๐Ÿ“… 1968 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 135 KB

Carbons were prepared from carbonized polyvinylidene chloride (850ยฐC) by activation with CO, at 830ยฐC to 85 per cent burn-off. Characterization of these carbons was made from gas phase adsorption data using nitrogen (77ยฐK) and carbon dioxide (195" and 273ยฐK) as adsorbates in conjunction with the Dub