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Influence of substrate on structural properties of TiO2 thin films obtained via MOCVD

✍ Scribed by Giovanni A. Battiston; Rosalba Gerbasi; Marina Porchia; Antonio Marigo

Book ID
118367511
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
489 KB
Volume
239
Category
Article
ISSN
0040-6090

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TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 Β°C. The str