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Influence of SiO2 cap layers on lateral solid-phase epitaxy of implanted amorphous Si films

✍ Scribed by H. Ishiwara; N. Tomita; T. Dan; S. Furukawa

Book ID: 113280202
Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 376 KB
Volume: 39
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(89)90811-2

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