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Influence of siliconizing on the oxidation behavior of a γ-TiAl based alloy

✍ Scribed by X.Y Li; S Taniguchi; Y Matsunaga; K Nakagawa; K Fujita

Book ID: 117681495
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 470 KB
Volume: 11
Category: Article
ISSN: 0966-9795
DOI: 10.1016/s0966-9795(02)00193-0

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## Abstract The influence of water vapour on the oxidation of Ti‐50 at.% Al was studied at 900°C. Thick, well‐adherent oxide scales were formed consisting of an outer TiO~2~ layer and an inner heterogeneous mixture of TiO~2~ and Al~2~O~3~. The interface between these layers is marked by large pores