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Influence of Moisture on the oxidation of γ-TiAl

✍ Scribed by R. Kremer; W. Auer

Publisher
John Wiley and Sons
Year
1997
Tongue
German
Weight
664 KB
Volume
48
Category
Article
ISSN
0947-5117

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✦ Synopsis

Abstract

The influence of water vapour on the oxidation of Ti‐50 at.% Al was studied at 900°C. Thick, well‐adherent oxide scales were formed consisting of an outer TiO~2~ layer and an inner heterogeneous mixture of TiO~2~ and Al~2~O~3~. The interface between these layers is marked by large pores and Al~2~O~3~ particles embedded in TiO~2~. No compact Al~2~O~3~ barrier layer was observed. The oxidation leads to formation of a two phase, oxygen enriched subsurface zone, which is Al‐depleted by inner oxidation of Al to Al~2~O~3~.

The oxidation kinetics were followed by continuous thermogravimetry. Exposure in moist oxygen leads to an accelerated attack compared with oxidation in dry oxygen. In moist oxygen the rate is linear after a short transition period. The oxidation rate is influenced by water partial pressure and oxygen partial pressure.

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