Influence of postdeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta[sub 2]O[sub 5] thin films for dynamic random access memory applications

✍ Scribed by Joshi, P. C.; Cole, M. W.

• Book ID: 121512165
• Publisher: American Institute of Physics
• Year: 1999
• Tongue: English
• Weight: 468 KB
• Volume: 86
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.370817