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Influence of postdeposition annealing on structural properties and electrical characteristics of thin Tm2O3 and Tm2Ti2O7 dielectrics

โœ Scribed by Tung-Ming Pan; Li-Chen Yen


Book ID
108064202
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
637 KB
Volume
256
Category
Article
ISSN
0169-4332

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In this paper, we describe the physical properties and electrical characteristics of thin Sm 2 O 3 dielectric films deposited on Si (100) by means of rf reactive sputtering. The structural and morphological features of these films were studied, as a function of the growth conditions (three various a