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Effect of La doping on structural and electrical properties of Bi2Ti2O7thin films

✍ Scribed by X.N. Yang; B.B. Huang; H.B. Wang; S.X. Shang; W.F. Yao; J.Y. Wei


Book ID
108165863
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
229 KB
Volume
270
Category
Article
ISSN
0022-0248

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## Abstract Glancing‐angle deposition (GLAD) was used in this work to grow transparent oxide Cu~2~O thin films by annealing in air at 185 °C of copper films deposited firstly by this method onto glass substrates. The annealing temperature of 185 °C corresponds to the optimal temperature that corres