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Influence of plasma treatment on the surface roughness of vapour-deposited metal films

✍ Scribed by Dr. H.-J. Tiller; Dr. U. Demme; Diplom-Chemiker D. Lenke; cand. chem. P. Bühner; Prof. Dr. K. Meyer


Publisher
John Wiley and Sons
Year
1975
Tongue
English
Weight
282 KB
Volume
10
Category
Article
ISSN
0232-1300

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Sputtering-induced surface roughness is the main source of degradation of the depth resolution observed during depth proÐling of polycrystalline metals. Atomic force microscopy (AFM) images of polycrystalline Al Ðlms at di †erent mean sputtered depths are used to calculate both the depth distributio