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Influence of passivating interlayer on Ge/HfO2 and Ge/Al2O3 interface band diagrams

✍ Scribed by V.V. Afanas’ev; A. Stesmans; A. Delabie; F. Bellenger; M. Houssa; R.R. Lieten; C. Merckling; J. Penaud; D.P. Brunco; M. Meuris

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
394 KB
Volume
11
Category
Article
ISSN
1369-8001

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