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Influence of negative metal ion bombardment on the properties of ITO/PET films deposited by dc magnetron sputtering

✍ Scribed by Daeil Kim


Book ID
116667459
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
599 KB
Volume
331
Category
Article
ISSN
0022-3093

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Transparent conducting indium tin oxide (ITO) thin films were prepared on glass substrates by a magnetron sputter type negative ion source which requires cesium (Cs) vapor injection for surface negative ionization on the ITO target surface. Although the film was prepared at 70 Β°C, it attained high o