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Influence of intrinsic point defects on the formation of structural defects and optically active centers during the annealing of erbium-and dysprosium-implanted silicon

✍ Scribed by N. A. Sobolev; E. I. Shek; A. M. Emel’yanov; V. I. Vdovin; T. G. Yugova


Book ID
110120118
Publisher
Springer
Year
1999
Tongue
English
Weight
57 KB
Volume
33
Category
Article
ISSN
1063-7826

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