Photoluminescence, capacitance-voltage and transmission electron microscopy studies have been carried out on structures containing a sheet of a self-assembled InAs quantum dots formed in GaAs matrices after the deposition of a 1.7 ML of InAs at 480 β’ C. The use of n-and p-type GaAs matrices allows u
Influence of In0.15Ga0.85As capping layers on the electron and hole energy levels of InAs quantum dots
β Scribed by Mirja Richter; Dirk Reuter; Jean-Yves Duboz; Andreas D. Wieck
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 346 KB
- Volume
- 40
- Category
- Article
- ISSN
- 1386-9477
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β¦ Synopsis
Self-assembled InAs/(In,Ga)As quantum dots were embedded into n-or p-type Schottky diodes to investigate the conduction and valence band states, respectively. The samples were prepared by molecular beam epitaxy, and capacitance-voltage (C(V)) spectroscopy as well as photoluminescence (PL) measurements were performed and compared here. To study the influence of the capping layer, the quantum dots were overgrown either by GaAs or In 0.15 Ga 0.85 As. For the In 0.15 Ga 0.85 As cap, the ground state PL at 300 K is red-shifted to 1319 nm as compared to 1261 nm for the GaAs cap. This red-shift observed in PL is compared to the shift of the corresponding electron and hole energy levels obtained from C(V) spectroscopy. It is found that only 18% of the red-shift originate from the valence band states, while 82% originate from the conduction band states.
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